TOSHIBA AMERICA ELECTRONIC COMPONENTS, INC.
TC220/223 SLI ASIC 0.3µm
Standard Cell, Embedded
Arrays, Gate Arrays
Description
The 0.3µm drawn TC220/223 ASIC technology
provides the optimum density and performance
needed for System-Level Integration (SLI) IC designs.
Product Features
2.1M usable gates
90ps loaded NAND gate delay for high-performance
systems
Extensive core and cell libraries for SLI
implementation
3 ranges of macrocells for speed/power optimization
Technology libraries compatible with TC200 series
ASIC family for ease of migration
TOSHIBA
Accurate delay modeling ensures system
predictability
Commercial EDA sign-off for flexibility
True mixed 3.3/5V I/O operation with TC223
A wide range of packaging options available,
including BGA, TAB-BGA, heatspreader plastic,
QFP, TAB-QFP, and others to suit all applications
Applications
The TC220 has been targeted at low-power and SLI
ASIC designs. Typical applications include LAN,
access, set-top boxes, printers, mass storage, and
graphics chipsets. The TC223 enables designers to
incorporate a 3V core and a true 5V I/O interface.
TC220C Standard Cell Product Summary
Usable Gates Maximum I/O Pads
Part Number DLM TLM Wirebond Pads TCP-TBGA PQFP{TAB} TBGA
TC220C040/540 59,000 98,000 104 148 200
TC220C060/560 83,000 137,000 128 184 248
TC220C080/580 113,000 186,000 144 212 288
TC220C100/600 137,000 225,000 160 236 316
TC220C120/620 167,000 273,000 176 260 348
TC220C140/640 200,000 327,000 192 284 380
TC220C160/660 224,000 360,000 208 312 420
TC220C180/680 260,000 418,000 224 336 452
TC220C200/700 299,000 481,000 240 360 484
TC220C220/720 341,000 547,000 256 384 516
TC220C240/740 385,000 618,000 272 408 548
TC220C260/760 432,000 694,000 288 432
TC220C280/780 481,000 773,000 304 456
TC220C300/800 534,000 857,000 320 480
TC220C320/820 589,000 945,000 336 504
TC220C340/840 635,000 1,024,000 360 540
TC220C360/860 723,000 1,166,000 384 576
TC220C380/880 817,000 1,317,000 408 612
TC220C400/900 916,000 1,477,000 432 648
TC220C420/920 1,288,000 2,100,000 512 768
NOTE: DLM = Double-Layer Metal, TLM = Triple-Layer Metal
TOSHIBA
NORTHWEST
San Jose, CA
TEL: (408) 526-2400
FAX: (408) 526-2410
Portland, OR
TEL: (503) 629-0818
FAX: (503) 629-0827
SOUTHWEST
Irvine, CA
TEL: (949) 453-0224
FAX: (949) 453-0125
Dallas, TX
TEL: (972) 480-0470
FAX: (972) 235-4114
CENTRAL
Chicago, IL
TEL: (847) 945-1500
FAX: (847) 945-1044
NORTHEAST
Boston, MA
TEL: (781) 224-0074
FAX: (781) 224-1096
Edison, NJ
TEL: (732) 248-8070
FAX: (732) 248-8030
SOUTHEAST
Atlanta, GA
TEL: (770) 931-3363
FAX: (770) 931-7602
TAEC Regional Sales Offices
System-Level IC Cores and Cells
Toshiba’s SLI ASIC TC220/223 family is supported by
cores and cells such as Analog PLL, 10/100 Ethernet,
ATM, RISC, PCI, USB, 1394, LVDS, etc. In addition,
Toshiba has established partnerships with IP providers
so the broadest offering of IP can be accessed for a
design.
Optimized Macrocell Performance
The TC220 family has three ranges of macrocells for
speed/power optimization.
Cell Type*
Normal High-Speed Ultra-Speed
Delay 225ps 140ps 90ps
Power 1.42W/MHz 1.86µW/MHz 2.73µW/MHz
* 2-input NAND, fanout = 2 plus typical interconnect load, nominal operating
conditions
High-Performance I/O
The TC220/223 is supported by a range of high-perfor-
mance I/O options, including PCI, high-performance
GTL, 3V failsafe, and low undershoot buffers.
Accurate Models
The TC220/223 incorporates Toshiba’s accurate delay
model which includes effect of via resistance and
interwire capacitance, as well as the following features:
Pin-to-pin timing
State-dependent delay
Table Look-up delay
Input slew
Non-linear equation
Commercial EDA Tool Sign-off
The TC220/223 is supported by Toshiba’s open EDA
strategy based on sign-off on multiple commercial EDA
tools. Support includes Static Timing Sign-off (STSO)
and Toshiba’s Timing-Driven Flow (TDF) that can
reduce SLI design iterations an order of magnitude and
achieve timing convergence.
Toshiba has a range of Design for Test (DFT) support,
including SCAN, Partial SCAN, BIST, and Boundary
SCAN.
Technology Resource Centers
Toshiba SLI ASIC Technology Resource Centers are
located throughout the U.S. to provide technical support
before, during, and after the design of a Toshiba ASIC.
This includes support dealing with EDA environments
and design kits, Toshiba design methodologies, ASIC
technologies, and design implementation.
In addition, Toshiba’s North America Semiconductor
Engineering Development Center based in San Jose, CA
is staffed with system, technology, and EDA design
experts who work with customers on advanced System
IC applications.
High-Quality, High-Volume Manufacturing
Toshiba’s ASIC manufacturing plants are among the
largest and most advanced in the world. They are all
certified to ISO9000. Rigorous quality control coupled
with a sophisticated batch tracking system allows
Toshiba to meet the needs of fast-ramping, high-volume
markets.
The technical data may be controlled under U.S. Export Administration Regulations and may be subject to the approval of the U.S. Department of Commerce prior to export. Any export or re-
export directly or indirectly, in contravention of the U.S. Export Administration regulations, is strictly prohibited.
TDF is a trademark of Toshiba Corporation.
All others are owned by their respective manufacturer and may be registered in certain jurisdictions.